Preparation of Thin FilmsCRC Press, 26/02/1992 - 392 من الصفحات "Preparation of Thin Films provides a comprehensive account of various deposition techniques for the preparation of thin films of elements, compounds, alloys, ceramics, and semiconductors - emphasizing inorganic compound thin films and discussing high vacuum and chemical deposition methods used for preparing high temperature superconducting oxide thin films. " |
المحتوى
Vacuum Evaporation | 1 |
Sputtering | 41 |
Ion Beam and IonAssisted Deposition | 103 |
Reactive Deposition Techniques | 143 |
Ionized Cluster Beam Methods | 209 |
Chemical Methods of Film Deposition | 225 |
Epitaxial Film Deposition Techniques | 309 |
Other Methods of Film Deposition | 341 |
Summary | 359 |
| 373 | |
عبارات ومصطلحات مألوفة
Å/min alloy amorphous annealing anode Appl argon atoms CdTe chamber chemical chemical vapor deposition coating composition compound crucible Cryst current density Data from Ref deposited films deposition rate doping electron beam energy epitaxial films filament film deposition flash evaporation flow rate flux GaAs glass glow discharge growth hydrogen inlet ion beam deposition ion beam sputtering ion bombardment ion plating ion source layers Lett magnetron magnetron sputtering material metal method mixture MOCVD molecular beam epitaxy mtorr nitride optical oxide oxygen p-type Phys planar plasma properties pure quartz reaction reactive gas reactor reported Schematic diagram semiconductor setup shown in Figure SiH4 silane silicon SiO2 spray sputter deposition sputtering system stoichiometric substrate holder substrate temperature surface target Technol thermal thickness thin films Thin Solid Films tion titanium torr triode tube ultra high vacuum vacuum vapor deposition voltage wafers X-ray YBCO